Lithographic apparatus and device manufacturing method

The invention relates to a lithographic apparatus (1) including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a particle-tight s...

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Bibliographische Detailangaben
Hauptverfasser: VAN DE VEN, BASTIAAN LAMBERTUS WILHELMUS MARINUS, HAM, ERIK LEONARDUS
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The invention relates to a lithographic apparatus (1) including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a particle-tight storage container (4) defining a storage space for storing patterning structures (8), wherein the storage container (4) is arranged to be coupled with a transfer container (6) such that the transfer container (6) for exchanging patterning structures (8) between the transfer container (6) and the lithographic apparatus (1) through a closeable passage (26) between the transfer container (6) and the storage container (4), a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.