Process and apparatus for embossing a film surface
A process is provided for continuously embossing a pattern onto a surface of a film. The process includes heating a resin material to form a flowable melt; discharging the melt into a first nip (18), wherein the first nip (18) is an area of contact between an embossing roll (20) and a backside roll...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A process is provided for continuously embossing a pattern onto a surface of a film. The process includes heating a resin material to form a flowable melt; discharging the melt into a first nip (18), wherein the first nip (18) is an area of contact between an embossing roll (20) and a backside roll (22); pressing the melt against the embossing roll (20) and the backside roll (22); and forming a self-supporting film (29) with a surface having an embossed pattern thereon. The embossed roll (20) is heated to a temperature greater than a glass transition temperature of the resin whereas the backside roll (22) is heated to a temperature less than the glass transition temperature of the resin. |
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