Laser produced plasma radiation system with contamination barrier
The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both...
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| creator | SIDELNIKOV, YURII VICTOROVITCH BAKKER, LEVINUS PIETER SCHUURMANS, FRANK JEROEN PIETER BANINE, VADIM YEVGENYEVICH KURT, RALPH |
| description | The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1491963A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1491963A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1491963A33</originalsourceid><addsrcrecordid>eNrjZHD0SSxOLVIoKMpPKU1OTVEoyEkszk1UKEpMyUwsyczPUyiuLC5JzVUozyzJUEjOzytJzM3Mg8gkJRYVZaYW8TCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeNcAQxNLQ0szY0djYyKUAADpcDH4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Laser produced plasma radiation system with contamination barrier</title><source>esp@cenet</source><creator>SIDELNIKOV, YURII VICTOROVITCH ; BAKKER, LEVINUS PIETER ; SCHUURMANS, FRANK JEROEN PIETER ; BANINE, VADIM YEVGENYEVICH ; KURT, RALPH</creator><creatorcontrib>SIDELNIKOV, YURII VICTOROVITCH ; BAKKER, LEVINUS PIETER ; SCHUURMANS, FRANK JEROEN PIETER ; BANINE, VADIM YEVGENYEVICH ; KURT, RALPH</creatorcontrib><description>The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050817&DB=EPODOC&CC=EP&NR=1491963A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050817&DB=EPODOC&CC=EP&NR=1491963A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SIDELNIKOV, YURII VICTOROVITCH</creatorcontrib><creatorcontrib>BAKKER, LEVINUS PIETER</creatorcontrib><creatorcontrib>SCHUURMANS, FRANK JEROEN PIETER</creatorcontrib><creatorcontrib>BANINE, VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>KURT, RALPH</creatorcontrib><title>Laser produced plasma radiation system with contamination barrier</title><description>The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD0SSxOLVIoKMpPKU1OTVEoyEkszk1UKEpMyUwsyczPUyiuLC5JzVUozyzJUEjOzytJzM3Mg8gkJRYVZaYW8TCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeNcAQxNLQ0szY0djYyKUAADpcDH4</recordid><startdate>20050817</startdate><enddate>20050817</enddate><creator>SIDELNIKOV, YURII VICTOROVITCH</creator><creator>BAKKER, LEVINUS PIETER</creator><creator>SCHUURMANS, FRANK JEROEN PIETER</creator><creator>BANINE, VADIM YEVGENYEVICH</creator><creator>KURT, RALPH</creator><scope>EVB</scope></search><sort><creationdate>20050817</creationdate><title>Laser produced plasma radiation system with contamination barrier</title><author>SIDELNIKOV, YURII VICTOROVITCH ; BAKKER, LEVINUS PIETER ; SCHUURMANS, FRANK JEROEN PIETER ; BANINE, VADIM YEVGENYEVICH ; KURT, RALPH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1491963A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2005</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SIDELNIKOV, YURII VICTOROVITCH</creatorcontrib><creatorcontrib>BAKKER, LEVINUS PIETER</creatorcontrib><creatorcontrib>SCHUURMANS, FRANK JEROEN PIETER</creatorcontrib><creatorcontrib>BANINE, VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>KURT, RALPH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SIDELNIKOV, YURII VICTOROVITCH</au><au>BAKKER, LEVINUS PIETER</au><au>SCHUURMANS, FRANK JEROEN PIETER</au><au>BANINE, VADIM YEVGENYEVICH</au><au>KURT, RALPH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Laser produced plasma radiation system with contamination barrier</title><date>2005-08-17</date><risdate>2005</risdate><abstract>The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Laser produced plasma radiation system with contamination barrier |
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