Laser produced plasma radiation system with contamination barrier

The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both...

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Bibliographische Detailangaben
Hauptverfasser:	SIDELNIKOV, YURII VICTOROVITCH, BAKKER, LEVINUS PIETER, SCHUURMANS, FRANK JEROEN PIETER, BANINE, VADIM YEVGENYEVICH, KURT, RALPH
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method.