Lithographic apparatus and device manufacturing method

The apparatus has an alignment unit that adjusts position and magnification of a pattern that is projected onto a substrate (10), and a best focus image plane. A detector unit (16) has a set of sensors that simultaneously inspects alignment marks on substrate across full width of the substrate, duri...

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Bibliographische Detailangaben
Hauptverfasser:	GEORGE, RICHARD ALEXANDER, GUI, GHENG-QUN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The apparatus has an alignment unit that adjusts position and magnification of a pattern that is projected onto a substrate (10), and a best focus image plane. A detector unit (16) has a set of sensors that simultaneously inspects alignment marks on substrate across full width of the substrate, during exposure of the substrate by an exposing unit (17) to optimize the exposure conditions. An independent claim is also included for a device manufacturing method.