Lithographic apparatus and device manufacturing method

A lithographic projection apparatus contains a projection system for projecting a patterned beam onto a target portion of the substrate. The projection system contains one or more optically active mirrors (20) and heat shields (22,28,29) specifically located for intercepting heat radiation to or fro...

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Bibliographische Detailangaben
Hauptverfasser:	FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS, BOX, WILHELMUS JOSEPHUS, LOOPSTRA, ERIK ROELOF, SMITS, JOSEPHUS JAKOBUS, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS, VAN DER WIJST, MARC WILHELMUS MARIA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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