Lithographic apparatus and device manufacturing method

A lithographic projection apparatus contains a projection system for projecting a patterned beam onto a target portion of the substrate. The projection system contains one or more optically active mirrors (20) and heat shields (22,28,29) specifically located for intercepting heat radiation to or fro...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS, BOX, WILHELMUS JOSEPHUS, LOOPSTRA, ERIK ROELOF, SMITS, JOSEPHUS JAKOBUS, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS, VAN DER WIJST, MARC WILHELMUS MARIA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A lithographic projection apparatus contains a projection system for projecting a patterned beam onto a target portion of the substrate. The projection system contains one or more optically active mirrors (20) and heat shields (22,28,29) specifically located for intercepting heat radiation to or from the mirrors and/or their support structure (26). The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields preferably include heat shields that intercept heat radiation to or from the support structure and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.