LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHODS, MASK AND METHOD OF CHARACTERISING A MASK AND/OR PELLICLE
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the...
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| creator | JANSEN, ALBERT JOHANNES MARIA LUIJTEN, CARLO CORNELIS MARIA WEHRENS, MARTIJN GERARD DOMINIQUE HOFMANS, GERARDUS CAROLUS JOHANNUS BOOM, HERMAN BRULS, RICHARD JOSEPH DEMARTEAU, MARCEL JOHANNES LOUIS MARIE PONGERS, WILLEM RICHARD VAN DIJCK, HENDRIKUS ALPHONSUS LUDOVICUS BAGGEN, MARCEL KOENRAAD MARIE JASPER, JOHANNES CHRISTIAAN MARIA UITTERDIJK, TAMMO CICILIA, ORLANDO SERAPIO |
| description | A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier. |
| format | Patent |
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The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHODS, MASK AND METHOD OF CHARACTERISING A MASK AND/OR PELLICLE |
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