LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHODS, MASK AND METHOD OF CHARACTERISING A MASK AND/OR PELLICLE

A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the...

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Bibliographische Detailangaben
Hauptverfasser:	JANSEN, ALBERT JOHANNES MARIA, LUIJTEN, CARLO CORNELIS MARIA, WEHRENS, MARTIJN GERARD DOMINIQUE, HOFMANS, GERARDUS CAROLUS JOHANNUS, BOOM, HERMAN, BRULS, RICHARD JOSEPH, DEMARTEAU, MARCEL JOHANNES LOUIS MARIE, PONGERS, WILLEM RICHARD, VAN DIJCK, HENDRIKUS ALPHONSUS LUDOVICUS, BAGGEN, MARCEL KOENRAAD MARIE, JASPER, JOHANNES CHRISTIAAN MARIA, UITTERDIJK, TAMMO, CICILIA, ORLANDO SERAPIO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.