Supporting structure for use in a lithographic apparatus

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The...

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Hauptverfasser: BUIS, EDWIN JOHAN, VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, VISSER, RAIMOND, VAN ELP, JAN, TINNEMANS, PATRICIUS ALOYSIUS JACOBUS, VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES, VERVOORT, THIJS, DONDERS, SJOERD NICOLAAS LAMBERTUS, VAN DEN BERG, JOHANNES CHARLES ADRIANUS, VAN DE SANDE, HENRICUS JOHANNES ADRIANUS, SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES, HOOGKAMP, JAN FREDERIK, SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK, TEGENBOSCH, HENRICUS GERARDUS
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Sprache:eng ; fre ; ger
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creator BUIS, EDWIN JOHAN
VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS
VISSER, RAIMOND
VAN ELP, JAN
TINNEMANS, PATRICIUS ALOYSIUS JACOBUS
VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES
VERVOORT, THIJS
DONDERS, SJOERD NICOLAAS LAMBERTUS
VAN DEN BERG, JOHANNES CHARLES ADRIANUS
VAN DE SANDE, HENRICUS JOHANNES ADRIANUS
SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES
HOOGKAMP, JAN FREDERIK
SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK
TEGENBOSCH, HENRICUS GERARDUS
description The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1465012A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1465012A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1465012A23</originalsourceid><addsrcrecordid>eNrjZLAILi0oyC8qycxLVyguKSpNLiktSlVIyy9SKC1OVcjMU0hUyMksychPL0osyMhMVkgsKEgsSiwpLeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYYmZqYGhkaORsZEKAEA63EuVg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Supporting structure for use in a lithographic apparatus</title><source>esp@cenet</source><creator>BUIS, EDWIN JOHAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VISSER, RAIMOND ; VAN ELP, JAN ; TINNEMANS, PATRICIUS ALOYSIUS JACOBUS ; VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES ; VERVOORT, THIJS ; DONDERS, SJOERD NICOLAAS LAMBERTUS ; VAN DEN BERG, JOHANNES CHARLES ADRIANUS ; VAN DE SANDE, HENRICUS JOHANNES ADRIANUS ; SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES ; HOOGKAMP, JAN FREDERIK ; SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK ; TEGENBOSCH, HENRICUS GERARDUS</creator><creatorcontrib>BUIS, EDWIN JOHAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VISSER, RAIMOND ; VAN ELP, JAN ; TINNEMANS, PATRICIUS ALOYSIUS JACOBUS ; VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES ; VERVOORT, THIJS ; DONDERS, SJOERD NICOLAAS LAMBERTUS ; VAN DEN BERG, JOHANNES CHARLES ADRIANUS ; VAN DE SANDE, HENRICUS JOHANNES ADRIANUS ; SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES ; HOOGKAMP, JAN FREDERIK ; SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK ; TEGENBOSCH, HENRICUS GERARDUS</creatorcontrib><description>The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHAMBERS PROVIDED WITH MANIPULATION DEVICES ; CINEMATOGRAPHY ; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GENERATION ; HAND TOOLS ; HOLOGRAPHY ; MANIPULATORS ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PORTABLE POWER-DRIVEN TOOLS ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20041006&amp;DB=EPODOC&amp;CC=EP&amp;NR=1465012A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20041006&amp;DB=EPODOC&amp;CC=EP&amp;NR=1465012A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BUIS, EDWIN JOHAN</creatorcontrib><creatorcontrib>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creatorcontrib><creatorcontrib>VISSER, RAIMOND</creatorcontrib><creatorcontrib>VAN ELP, JAN</creatorcontrib><creatorcontrib>TINNEMANS, PATRICIUS ALOYSIUS JACOBUS</creatorcontrib><creatorcontrib>VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES</creatorcontrib><creatorcontrib>VERVOORT, THIJS</creatorcontrib><creatorcontrib>DONDERS, SJOERD NICOLAAS LAMBERTUS</creatorcontrib><creatorcontrib>VAN DEN BERG, JOHANNES CHARLES ADRIANUS</creatorcontrib><creatorcontrib>VAN DE SANDE, HENRICUS JOHANNES ADRIANUS</creatorcontrib><creatorcontrib>SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES</creatorcontrib><creatorcontrib>HOOGKAMP, JAN FREDERIK</creatorcontrib><creatorcontrib>SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK</creatorcontrib><creatorcontrib>TEGENBOSCH, HENRICUS GERARDUS</creatorcontrib><title>Supporting structure for use in a lithographic apparatus</title><description>The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHAMBERS PROVIDED WITH MANIPULATION DEVICES</subject><subject>CINEMATOGRAPHY</subject><subject>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</subject><subject>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GENERATION</subject><subject>HAND TOOLS</subject><subject>HOLOGRAPHY</subject><subject>MANIPULATORS</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PORTABLE POWER-DRIVEN TOOLS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAILi0oyC8qycxLVyguKSpNLiktSlVIyy9SKC1OVcjMU0hUyMksychPL0osyMhMVkgsKEgsSiwpLeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYYmZqYGhkaORsZEKAEA63EuVg</recordid><startdate>20041006</startdate><enddate>20041006</enddate><creator>BUIS, EDWIN JOHAN</creator><creator>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creator><creator>VISSER, RAIMOND</creator><creator>VAN ELP, JAN</creator><creator>TINNEMANS, PATRICIUS ALOYSIUS JACOBUS</creator><creator>VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES</creator><creator>VERVOORT, THIJS</creator><creator>DONDERS, SJOERD NICOLAAS LAMBERTUS</creator><creator>VAN DEN BERG, JOHANNES CHARLES ADRIANUS</creator><creator>VAN DE SANDE, HENRICUS JOHANNES ADRIANUS</creator><creator>SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES</creator><creator>HOOGKAMP, JAN FREDERIK</creator><creator>SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK</creator><creator>TEGENBOSCH, HENRICUS GERARDUS</creator><scope>EVB</scope></search><sort><creationdate>20041006</creationdate><title>Supporting structure for use in a lithographic apparatus</title><author>BUIS, EDWIN JOHAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VISSER, RAIMOND ; VAN ELP, JAN ; TINNEMANS, PATRICIUS ALOYSIUS JACOBUS ; VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES ; VERVOORT, THIJS ; DONDERS, SJOERD NICOLAAS LAMBERTUS ; VAN DEN BERG, JOHANNES CHARLES ADRIANUS ; VAN DE SANDE, HENRICUS JOHANNES ADRIANUS ; SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES ; HOOGKAMP, JAN FREDERIK ; SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK ; TEGENBOSCH, HENRICUS GERARDUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1465012A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHAMBERS PROVIDED WITH MANIPULATION DEVICES</topic><topic>CINEMATOGRAPHY</topic><topic>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</topic><topic>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GENERATION</topic><topic>HAND TOOLS</topic><topic>HOLOGRAPHY</topic><topic>MANIPULATORS</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PORTABLE POWER-DRIVEN TOOLS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BUIS, EDWIN JOHAN</creatorcontrib><creatorcontrib>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creatorcontrib><creatorcontrib>VISSER, RAIMOND</creatorcontrib><creatorcontrib>VAN ELP, JAN</creatorcontrib><creatorcontrib>TINNEMANS, PATRICIUS ALOYSIUS JACOBUS</creatorcontrib><creatorcontrib>VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES</creatorcontrib><creatorcontrib>VERVOORT, THIJS</creatorcontrib><creatorcontrib>DONDERS, SJOERD NICOLAAS LAMBERTUS</creatorcontrib><creatorcontrib>VAN DEN BERG, JOHANNES CHARLES ADRIANUS</creatorcontrib><creatorcontrib>VAN DE SANDE, HENRICUS JOHANNES ADRIANUS</creatorcontrib><creatorcontrib>SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES</creatorcontrib><creatorcontrib>HOOGKAMP, JAN FREDERIK</creatorcontrib><creatorcontrib>SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK</creatorcontrib><creatorcontrib>TEGENBOSCH, HENRICUS GERARDUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BUIS, EDWIN JOHAN</au><au>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</au><au>VISSER, RAIMOND</au><au>VAN ELP, JAN</au><au>TINNEMANS, PATRICIUS ALOYSIUS JACOBUS</au><au>VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES</au><au>VERVOORT, THIJS</au><au>DONDERS, SJOERD NICOLAAS LAMBERTUS</au><au>VAN DEN BERG, JOHANNES CHARLES ADRIANUS</au><au>VAN DE SANDE, HENRICUS JOHANNES ADRIANUS</au><au>SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES</au><au>HOOGKAMP, JAN FREDERIK</au><au>SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK</au><au>TEGENBOSCH, HENRICUS GERARDUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Supporting structure for use in a lithographic apparatus</title><date>2004-10-06</date><risdate>2004</risdate><abstract>The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
recordid cdi_epo_espacenet_EP1465012A2
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHAMBERS PROVIDED WITH MANIPULATION DEVICES
CINEMATOGRAPHY
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GENERATION
HAND TOOLS
HOLOGRAPHY
MANIPULATORS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PORTABLE POWER-DRIVEN TOOLS
SEMICONDUCTOR DEVICES
TRANSPORTING
title Supporting structure for use in a lithographic apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T03%3A30%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BUIS,%20EDWIN%20JOHAN&rft.date=2004-10-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1465012A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true