Supporting structure for use in a lithographic apparatus

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The...

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Bibliographische Detailangaben
Hauptverfasser:	BUIS, EDWIN JOHAN, VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, VISSER, RAIMOND, VAN ELP, JAN, TINNEMANS, PATRICIUS ALOYSIUS JACOBUS, VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES, VERVOORT, THIJS, DONDERS, SJOERD NICOLAAS LAMBERTUS, VAN DEN BERG, JOHANNES CHARLES ADRIANUS, VAN DE SANDE, HENRICUS JOHANNES ADRIANUS, SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES, HOOGKAMP, JAN FREDERIK, SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK, TEGENBOSCH, HENRICUS GERARDUS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES CINEMATOGRAPHY CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERATION HAND TOOLS HOLOGRAPHY MANIPULATORS MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PORTABLE POWER-DRIVEN TOOLS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure may be a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.