Lithographic apparatus comprising a temperature conditioned load lock

Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in sai...

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Bibliographische Detailangaben
Hauptverfasser:	VULLINGS, HENRICUS J. L. M, KUIPERS, LEO W. M, HOOGKAMP, JAN F, VISSER, RAIMOND, KLOMP, ALBERT J. H, VUGTS, JOSEPHUS C. J. A, FRANSSEN, JOHANNES H. G
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.