Focus spot monitoring in a lithographic projection apparatus

A lithographic projection apparatus and method of manufacturing devices using said apparatus is presented, wherein the apparatus comprises a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height ma...

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Bibliographische Detailangaben
Hauptverfasser:	VAN RHEE, TASJA, KOENEN, WILLEM HERMAN, GERTRUDA ANNA, BROERS, MICHAEL, CASTENMILLER, THOMAS JOSEPHUS MARIA, VAN ZON, ALEX
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus and method of manufacturing devices using said apparatus is presented, wherein the apparatus comprises a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. According to the invention the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of said surface of said substrate and to detect any focus spots on said surface of said substrate using said raw height map. By subtracting the average die topology, focus spots can be located more accurately then before.