composition for preparing porous dielectric films

The present invention provides a composition for preparing porous dielectric thin film containing pore-generating material, said composition comprising gemini detergent, fourth alkylammonate, thermo-stable organic or inorganic matrix precursor, and solvent for dissolving said two solid components. T...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, JAE GEUN, LYU, YI YEOL, CHANG, SEOK, YIM, JIN HEONG, KIM, JI MAN, LEE, KWANG HEE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES GENERAL PROCESSES OF COMPOUNDING INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention provides a composition for preparing porous dielectric thin film containing pore-generating material, said composition comprising gemini detergent, fourth alkylammonate, thermo-stable organic or inorganic matrix precursor, and solvent for dissolving said two solid components. There is also provided an interlayer insulating film having good mechanical property such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.