Lithographic apparatus and device manufacturing method
In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle th...
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| creator | JANSEN, ALBERT JOHANNES MARIA BAGGEN, MARCEL KOENRAAD MARIE BASELMANS, JOHANNES JACOBUS MATHEUS UITTERDIJK, TAMMO SCHRIJVER, RAYMOND LAURENTIUS JOHANNES BRULS, RICHARD JOSEPH PONGERS, WILLEM RICHARD ASPER, JOHANNES CHRISTIAAN MARIA |
| description | In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane. |
| format | Patent |
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The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040630&DB=EPODOC&CC=EP&NR=1434096A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040630&DB=EPODOC&CC=EP&NR=1434096A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JANSEN, ALBERT JOHANNES MARIA</creatorcontrib><creatorcontrib>BAGGEN, MARCEL KOENRAAD MARIE</creatorcontrib><creatorcontrib>BASELMANS, JOHANNES JACOBUS MATHEUS</creatorcontrib><creatorcontrib>UITTERDIJK, TAMMO</creatorcontrib><creatorcontrib>SCHRIJVER, RAYMOND LAURENTIUS JOHANNES</creatorcontrib><creatorcontrib>BRULS, RICHARD JOSEPH</creatorcontrib><creatorcontrib>PONGERS, WILLEM RICHARD</creatorcontrib><creatorcontrib>ASPER, JOHANNES CHRISTIAAN MARIA</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. 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The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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