Lithographic apparatus and device manufacturing method

In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle th...

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Bibliographische Detailangaben
Hauptverfasser:	JANSEN, ALBERT JOHANNES MARIA, BAGGEN, MARCEL KOENRAAD MARIE, BASELMANS, JOHANNES JACOBUS MATHEUS, UITTERDIJK, TAMMO, SCHRIJVER, RAYMOND LAURENTIUS JOHANNES, BRULS, RICHARD JOSEPH, PONGERS, WILLEM RICHARD, ASPER, JOHANNES CHRISTIAAN MARIA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.