A device manufacturing method using a lithographic projection mask

A method of determining relative positions of developed patterns using the step mode on a substrate using reference marks which are superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks for use in the method.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FRIZ, ALEXANDER, BEST, KEITH FRANK, CONSOLINI, JOSEPH J
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A method of determining relative positions of developed patterns using the step mode on a substrate using reference marks which are superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks for use in the method.