Droplet and filament target stabilizer for EUV source nozzles

An EUV radiation source (10) that creates a stable solid target filament. The source (10) includes a nozzle assembly (12) having a condenser chamber (14) for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice (16) of a target...

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Bibliographische Detailangaben
Hauptverfasser:	ORSINI, ROCCO A, PETACH, MICHAEL B, MCGREGOR, ROY D
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	An EUV radiation source (10) that creates a stable solid target filament. The source (10) includes a nozzle assembly (12) having a condenser chamber (14) for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice (16) of a target filament generator into an evaporation chamber (26) as a liquid target stream (18). The evaporation chamber (26) has a higher pressure than a vacuum process chamber (26) of the source (10) to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into the process chamber (26) as a stable target filament towards a target area (20). The higher pressure in the evaporation chamber (26) can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.