SPUTTERING TARGET FOR THE DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM

A sputtering target containing a hexagonal system laminar compound of composition In 2O 3(ZnO) m (where m represents an integer of 2 to 7) composed of indium oxide and zinc oxide and 0.01 to 1 atom% of an oxide of a third element having a valence of plus 4.

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Bibliographische Detailangaben
Hauptverfasser:	MATSUZAKI, SHIGEO, INOUE, KAZUYOSHI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	A sputtering target containing a hexagonal system laminar compound of composition In 2O 3(ZnO) m (where m represents an integer of 2 to 7) composed of indium oxide and zinc oxide and 0.01 to 1 atom% of an oxide of a third element having a valence of plus 4.