Pattern formation

A precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composi...

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Bibliographische Detailangaben
Hauptverfasser:	PARSONS, GARETH RHODRI, RILEY, DAVID STEPHEN, MCCULLOUGH, CHRISTOPHER DAVID, HOARE, RICHARD DAVID, MULLIGAN, JAMES LAURENCE, KITSON, ANTHONY PAUL, MONK, ALAN STANLEY VICTOR, RAY, KEVIN BARRY, BAYES, STUART, SMITH, CAROLE-ANNE, HEARSON, JOHN ANDREW, RICHES, JOHN DAVID, BENNETT, PETER ANDREW REATH, SPOWAGE, MARK JOHN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLOUR PRINTING ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	A precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous developer (hereinafter the "developer resistance means"), wherein said developer resistance means comprises one or more compounds which include a poly(alkylene oxide) unit.