Process of making an all-silicon microphone

The upper and lower capacitive plates are formed by etching the single crystal silicon layers that are doped with boron and germanium. A capacitive output signal is produced in response to changes in the distance between the capacitor plates that occur as a result of sound induced vibration.

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Bibliographische Detailangaben
Hauptverfasser:	BETZNER, TIMOTHY M, QUEEN, GEORGE M, VAS, TIMOTHY A, CHRISTENSON, JOHN C, FREEMAN, JOHN E, BANEY, WILLIAM J, CHILCOTT, DAN W, LONG, STEPHEN P
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS DEAF-AID SETS ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKEACOUSTIC ELECTROMECHANICAL TRANSDUCERS MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS PUBLIC ADDRESS SYSTEMS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The upper and lower capacitive plates are formed by etching the single crystal silicon layers that are doped with boron and germanium. A capacitive output signal is produced in response to changes in the distance between the capacitor plates that occur as a result of sound induced vibration.