ELECTRODE ARRANGEMENT FOR THE PLASMA-SUPPORTED MAGNETICALLY-GUIDED DEPOSITION OF THIN LAYERS IN VACUO
The invention relates to an electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo, with several parallel longitudinal electrodes with components made from permanent magnets for the generation of a magnetic field after the principle of the magnetron, of...
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Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to an electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo, with several parallel longitudinal electrodes with components made from permanent magnets for the generation of a magnetic field after the principle of the magnetron, of such dimensions as to form magnet tunnels with essentially the same cross-section and the same magnetic field strength over electrode regions running parallel to each other. Just one magnetic field generating unit or a part thereof is assigned to each of the at least one longitudinal electrodes, which for the case of erosion, only provides an adequate uniform shaping of the magnetic tunnel along the straight regions of the erosion trenches on said longitudinal electrode with an adequate field strength, on superposition with the magnetic field of other neighbouring magnetic field generating components on other longitudinal electrodes. |
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