Test photomask, flare evaluation method, and flare compensation method

Through use of a line pattern (1) which becomes a pattern under measurement and a zone pattern (2) in a zonal shape which becomes a flare causing pattern forming a light transmission region which surrounds the line pattern (1) and causes local flare to occur on the line pattern (1), the effect of th...

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Bibliographische Detailangaben
Hauptverfasser:	HANYU, ISAMU, KIRIKOSHI, KATSUYOSHI, YAO, TERUYOSHI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Through use of a line pattern (1) which becomes a pattern under measurement and a zone pattern (2) in a zonal shape which becomes a flare causing pattern forming a light transmission region which surrounds the line pattern (1) and causes local flare to occur on the line pattern (1), the effect of the local flare due to the zone pattern (2) on the line pattern (1) is measured as a line width of the line pattern (1) for evaluation. Further, this measurement value is used to compensate for the effect of the local flare on each real pattern.