Stereolithographic resins with high temperature and high impact resistance
A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance comprising a mixture of (1) at least one alicyclic epoxide having at least two epoxy groups; and (2) at least one difunctional or higher functional glycidylether of a polyhydric compound; (B) at lea...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance comprising a mixture of (1) at least one alicyclic epoxide having at least two epoxy groups; and (2) at least one difunctional or higher functional glycidylether of a polyhydric compound; (B) at least one free-radical polymerizing organic substance comprising a mixture of (1) optionally, at least one trifunctional or higher functional (meth)acrylate compound; and (2) at least one aromatic di(meth)acrylate compound; (C) at least one cationic polymerization initiator; (D) at least one free-radical polymerization initiator; (E) optionally, at least one hydroxyl-functional aliphatic compound; and (F) at least one hydroxyl-functional aromatic compound; wherein the concentration of hydroxyl groups in the radiation-curable composition is at least about 1.1 equivalent OH groups per kilogram; wherein the concentration of epoxy groups in the radiation-curable composition is at least about 5.5 equivalent epoxy groups per kilogram; and wherein the amount of trifunctional or higher functional (meth)acrylate compound (B)(1) is from 0% to about 3% of the composition and the amount of aromatic di(meth)acrylate compound (B)(2) is at least 10% of the composition. |
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