Method for determining local structures in optical crystals

Method for detecting local structures in optical materials, especially crystals, whereby in a first step schlieren and optical inhomogeneities are detected using divergent white light, while in a second step polarized laser light is used with stress birefringence to detect local defects and structur...

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Bibliographische Detailangaben
Hauptverfasser:	LEMKE, CHRISTIAN, ENGEL, AXEL, MOERSEN, EWALD, GRABOSCH,GUENTER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	Method for detecting local structures in optical materials, especially crystals, whereby in a first step schlieren and optical inhomogeneities are detected using divergent white light, while in a second step polarized laser light is used with stress birefringence to detect local defects and structural defects with spatial resolution of at least 0.5 mm and in a third step an interferometric examination of the material is executed.