METHOD AND DEVICE FOR PRODUCING AN OPTICALLY ANTIREFLECTIVE SURFACE

Disclosed is a method for producing a surface structure which is antireflective for a wavelength range with a minimal wavelength lambdaM, having a supporting coat on which a light-sensitive material is applied which is exposed with at least two mutually coherent wave fields with a wavelength of lamb...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BLAESI, BENEDIKT, GOMBERT, ANDREAS, KUEBLER, VOLKER, BOERNER, VOLKMAR
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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