METHOD AND DEVICE FOR PRODUCING AN OPTICALLY ANTIREFLECTIVE SURFACE

Disclosed is a method for producing a surface structure which is antireflective for a wavelength range with a minimal wavelength lambdaM, having a supporting coat on which a light-sensitive material is applied which is exposed with at least two mutually coherent wave fields with a wavelength of lamb...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BLAESI, BENEDIKT, GOMBERT, ANDREAS, KUEBLER, VOLKER, BOERNER, VOLKMAR
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method for producing a surface structure which is antireflective for a wavelength range with a minimal wavelength lambdaM, having a supporting coat on which a light-sensitive material is applied which is exposed with at least two mutually coherent wave fields with a wavelength of lambdaB in order to obtain a stochastically distributed interference field, whereby during or after exposure, said surface structure is formed by means of selective removal of materials. The invention is distinguished by mutually interfering, coherent wave fields directed at the light-sensitive coat of material forming an angle alpha, for which applies: alpha>2 arcsin(lambdaB/(2.lambdaM))