METHOD FOR PRODUCING PARTS AND A VACUUM PROCESSING SYSTEM

When producing coated parts, the same demands for coating the parts are made as those for effecting a coating with an epitaxial layer. According to the invention, a reactive gas is admitted into a process chamber (PR) and is activated by means of a low-energy plasma discharge. In order to improve th...

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Bibliographische Detailangaben
Hauptverfasser:	RAMM, JUERGEN, WAGNER, RUDOLF, WILTSCHE, SIEGFRIED
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	When producing coated parts, the same demands for coating the parts are made as those for effecting a coating with an epitaxial layer. According to the invention, a reactive gas is admitted into a process chamber (PR) and is activated by means of a low-energy plasma discharge. In order to improve the industrial capability of a method of the aforementioned type, the process chamber (PR) is separated (14) from the inner wall of the recipient (1) located in the surrounding area.