Method of manufacturing a hollow cathode magnetron sputtering target and sputtering target assembly comprising the same

Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obt...

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Bibliographische Detailangaben
Hauptverfasser: FORD, ROBERT, B, MICHALUK, CHRISTOPHER, A
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.