TREATING AGENT FOR EXHAUST GAS CONTAINING METAL HYDRIDE, PROCESS FOR PRODUCING THE SAME, AND METHOD OF TREATING EXHAUST GAS CONTAINING METAL HYDRIDE

An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydride or basic copper hydride and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydride or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.