FLARE MEASURING METHOD AND FLARE MEASURING DEVICE, EXPOSURE METHOD AND EXPOSURE SYSTEM, METHOD OF ADJUSTING EXPOSURE SYSTEM

A flare measuring method and a flare measuring apparatus for measuring flaring occurring on optical systems, an exposure method and an exposure apparatus, and an exposure apparatus adjusting method capable of quantitatively measuring information regarding flare which occur on optical systems are to...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	HIKIMA, IKUO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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