FLARE MEASURING METHOD AND FLARE MEASURING DEVICE, EXPOSURE METHOD AND EXPOSURE SYSTEM, METHOD OF ADJUSTING EXPOSURE SYSTEM

A flare measuring method and a flare measuring apparatus for measuring flaring occurring on optical systems, an exposure method and an exposure apparatus, and an exposure apparatus adjusting method capable of quantitatively measuring information regarding flare which occur on optical systems are to...

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Bibliographische Detailangaben
1. Verfasser:	HIKIMA, IKUO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A flare measuring method and a flare measuring apparatus for measuring flaring occurring on optical systems, an exposure method and an exposure apparatus, and an exposure apparatus adjusting method capable of quantitatively measuring information regarding flare which occur on optical systems are to be provided. A flare measuring apparatus S for measuring flare which occur on optical system IL is provided with a light source device for irradiating an optical path including the optical system IL with an exposure light EL, a substrate M1 arranged on the optical path and provided with predetermined patterns C and T, a detecting device DT arranged on the image plane of a projecting optical system PL and capable of detecting information on the luminous energy of the light, and a control device CONT capable of controlling the irradiating range of the exposure light EL and acquiring information on flare on the basis of the result of detection of the exposure light EL by the detecting device DT.