PLASMA PROCESSING METHOD AND APPARATUS

A plasma processing apparatus includes a first chamber having a first wall with an inner peripheral surface and an outlet. A plurality of fluid supplying outlets are disposed along the first wall and are configured to supply a cooling fluid into the first chamber that travels in a circumferential di...

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Bibliographische Detailangaben
Hauptverfasser:	FRAIM, MICHAEL, LEE, SPIELMAN, RICK, B, SCHIEWE, ROBERT, R
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUSION REACTORS NUCLEAR ENGINEERING NUCLEAR PHYSICS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A plasma processing apparatus includes a first chamber having a first wall with an inner peripheral surface and an outlet. A plurality of fluid supplying outlets are disposed along the first wall and are configured to supply a cooling fluid into the first chamber that travels in a circumferential direction around the inner peripheral surface of the first wall and in a direction towards the outlet. The cooling fluid exiting the plurality of fluid supplying outlets forms a cooling layer for cooling the inner peripheral surface of the first wall, and the outlet is configured for allowing the cooling fluid to exit therethrough while retaining the plasma within the chamber.