Lithographic apparatus and device manufacturing method
A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the nee...
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| creator | MUHLBEYER, MICHAEL FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS LOOPSTRA, ERIK ROELOF MAUL, GUENTER MEHLKOPP, KLAUS HOF, ALBRECHT VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS SMITS, JOSEPHUS JACOBUS MOORS, JOHANNES HUBERTUS JOSEPHINA |
| description | A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1278089A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1278089A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1278089A33</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYZG5hYGFpaOxsZEKAEAfgQttg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>MUHLBEYER, MICHAEL ; FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS ; LOOPSTRA, ERIK ROELOF ; MAUL, GUENTER ; MEHLKOPP, KLAUS ; HOF, ALBRECHT ; VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS ; SMITS, JOSEPHUS JACOBUS ; MOORS, JOHANNES HUBERTUS JOSEPHINA</creator><creatorcontrib>MUHLBEYER, MICHAEL ; FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS ; LOOPSTRA, ERIK ROELOF ; MAUL, GUENTER ; MEHLKOPP, KLAUS ; HOF, ALBRECHT ; VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS ; SMITS, JOSEPHUS JACOBUS ; MOORS, JOHANNES HUBERTUS JOSEPHINA</creatorcontrib><description>A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10<-6> K<-1> thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040204&DB=EPODOC&CC=EP&NR=1278089A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040204&DB=EPODOC&CC=EP&NR=1278089A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MUHLBEYER, MICHAEL</creatorcontrib><creatorcontrib>FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK ROELOF</creatorcontrib><creatorcontrib>MAUL, GUENTER</creatorcontrib><creatorcontrib>MEHLKOPP, KLAUS</creatorcontrib><creatorcontrib>HOF, ALBRECHT</creatorcontrib><creatorcontrib>VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS</creatorcontrib><creatorcontrib>SMITS, JOSEPHUS JACOBUS</creatorcontrib><creatorcontrib>MOORS, JOHANNES HUBERTUS JOSEPHINA</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10<-6> K<-1> thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>IRRADIATION DEVICES</subject><subject>MATERIALS THEREFOR</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYZG5hYGFpaOxsZEKAEAfgQttg</recordid><startdate>20040204</startdate><enddate>20040204</enddate><creator>MUHLBEYER, MICHAEL</creator><creator>FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS</creator><creator>LOOPSTRA, ERIK ROELOF</creator><creator>MAUL, GUENTER</creator><creator>MEHLKOPP, KLAUS</creator><creator>HOF, ALBRECHT</creator><creator>VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS</creator><creator>SMITS, JOSEPHUS JACOBUS</creator><creator>MOORS, JOHANNES HUBERTUS JOSEPHINA</creator><scope>EVB</scope></search><sort><creationdate>20040204</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>MUHLBEYER, MICHAEL ; FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS ; LOOPSTRA, ERIK ROELOF ; MAUL, GUENTER ; MEHLKOPP, KLAUS ; HOF, ALBRECHT ; VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS ; SMITS, JOSEPHUS JACOBUS ; MOORS, JOHANNES HUBERTUS JOSEPHINA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1278089A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>IRRADIATION DEVICES</topic><topic>MATERIALS THEREFOR</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>MUHLBEYER, MICHAEL</creatorcontrib><creatorcontrib>FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK ROELOF</creatorcontrib><creatorcontrib>MAUL, GUENTER</creatorcontrib><creatorcontrib>MEHLKOPP, KLAUS</creatorcontrib><creatorcontrib>HOF, ALBRECHT</creatorcontrib><creatorcontrib>VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS</creatorcontrib><creatorcontrib>SMITS, JOSEPHUS JACOBUS</creatorcontrib><creatorcontrib>MOORS, JOHANNES HUBERTUS JOSEPHINA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MUHLBEYER, MICHAEL</au><au>FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS</au><au>LOOPSTRA, ERIK ROELOF</au><au>MAUL, GUENTER</au><au>MEHLKOPP, KLAUS</au><au>HOF, ALBRECHT</au><au>VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS</au><au>SMITS, JOSEPHUS JACOBUS</au><au>MOORS, JOHANNES HUBERTUS JOSEPHINA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2004-02-04</date><risdate>2004</risdate><abstract>A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10<-6> K<-1> thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR |
| title | Lithographic apparatus and device manufacturing method |
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