Lithographic apparatus and device manufacturing method

A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the nee...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MUHLBEYER, MICHAEL, FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS, LOOPSTRA, ERIK ROELOF, MAUL, GUENTER, MEHLKOPP, KLAUS, HOF, ALBRECHT, VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS, SMITS, JOSEPHUS JACOBUS, MOORS, JOHANNES HUBERTUS JOSEPHINA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.