Apparatus comprising a burner for producing silicon dioxide soot

A precision burner suitable for oxidizing halide-free, silicon-containing compounds, such as octamethylcyclotetrasiloxane (OMCTS), is provided. The burner may include a subassembly (13) which can be precisely mounted on a burner mounting block (107) through the use of an alignment stub (158), a rais...

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Bibliographische Detailangaben
Hauptverfasser:	POWERS, DALE R, KIEFER, WILLIAM J, DESORCIE, ROBERT B, CAIN, MICHAEL B
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AIR SUPPLY BLASTING BURNERS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMBUSTION APPARATUS COMBUSTION PROCESSES CONSUMING WASTE PRODUCTS BY COMBUSTION CREMATION FURNACES DIFFUSION TREATMENT OF METALLIC MATERIAL DRAUGHT-INDUCING GLASS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MECHANICAL ENGINEERING METALLURGY MINERAL OR SLAG WOOL SUPPLYING NON-COMBUSTIBLE LIQUID OR GAS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION WEAPONS
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Beschreibung
Zusammenfassung:	A precision burner suitable for oxidizing halide-free, silicon-containing compounds, such as octamethylcyclotetrasiloxane (OMCTS), is provided. The burner may include a subassembly (13) which can be precisely mounted on a burner mounting block (107) through the use of an alignment stub (158), a raised face (162) on the burner mounting block (107) and corresponding recess (160) in the back of the subassembly (13). Disclosed and claimed is an apparatus suitable for producing SiO2 containing soot, the apparatus comprising a burner having a burner face. The burner's face includes four concentric regions each for emitting a gas: a first central region (36,90) suitable for emitting a mixture of OMCTS and O2, a second innershield region (38,92) suitable for emitting N2, a third outershield region (40,42,94,96) suitable for emitting O2, and a fourth premix region (44,98) suitable for premissing and emitting a mixture of CH4 and O2. The burner provides more efficient use of halide-free silicon-containing raw materials than prior art burners.