Illumination system with reduced energy load

The system has an optical axis (OA) with a rod integrator (3) with inlet and outlet surfaces, an objective (11) for imaging an object field (13) on an image field (15). The objective is after the integrator and is arranged in a lens-free intermediate volume containing a plane optically conjugated to...

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Bibliographische Detailangaben
Hauptverfasser:	SOHMER, ALEXANDER, KOEHLER, JESS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The system has an optical axis (OA) with a rod integrator (3) with inlet and outlet surfaces, an objective (11) for imaging an object field (13) on an image field (15). The objective is after the integrator and is arranged in a lens-free intermediate volume containing a plane optically conjugated to the inlet surface plane. The thickness of the lens-free surface is at least 30 mm thick along the optical axis, especially at least 50 mm. Independent claims are also included for the following: a microlithographic projection illumination system.