Lithographic apparatus and device manufacturing method

Vibrational movement between the top of a lens (11) and a main plate (12) on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support (120) which detects relative movement between the lens and the main plates using piezoelectric sensors (40) and compensate...

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Bibliographische Detailangaben
Hauptverfasser:	AUER, FRANK, DE VRIES, THEODORUSJACOBUS ADRIANUS, HOLTERMAN, JAN, SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES, KOSTER, MARINUS PIETER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Vibrational movement between the top of a lens (11) and a main plate (12) on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support (120) which detects relative movement between the lens and the main plates using piezoelectric sensors (40) and compensates for that movement to reduce vibration using piezoelectric actuators (30) which are in series with the piezoelectric sensors. The control signal which is generated to actuate the actuated piezoelectrics is generated by a controller.