METHOD AND APPARATUS FOR THERMAL PROCESSING OF A PHOTOSENSITIVE ELEMENT

A method and apparatus for thermal processing a photosensitive element includes heating a composition layer on a flexible substrate to a melt temperature of an unirradiated area of the composition layer and maintaining the flexible substrate at a temperature below the melt temperature while pressing...

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Bibliographische Detailangaben
Hauptverfasser:	KANNURPATTI, Anandkumar, Ramakrishnan, CUSHNER, Stephen, JOHNSON, Melvin, Harry, BELFIORE, David, Anthony, BROWN, Robert, Lee, HACKLER, Mark, A, DRURY, Robert, Finley
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method and apparatus for thermal processing a photosensitive element includes heating a composition layer on a flexible substrate to a melt temperature of an unirradiated area of the composition layer and maintaining the flexible substrate at a temperature below the melt temperature while pressing a heated absorbent layer against the heated composition layer, and repeating these steps for multiple cycles. A further embodiment of the method includes a step of cooling the flexible substrate and layer laminate on each cycle to maintain the flexible substrate at the desired temperature below that of the heated composition layer.