METHOD AND APPARATUS FOR PERFORMING OPTICAL MEASUREMENTS OF LAYERS AND SURFACE PROPERTIES

The method and apparatus are capable of performing precise optical measurements of layers and surface properties (SB, SF) both transparent and also non-transparent substrates. A field stop aperture (11) in a confocal optical configuration is used to define the illumination area, and another aperture...

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Bibliographische Detailangaben
Hauptverfasser:	ROSENTHAL, PETER, A, XU, JIAZHAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	The method and apparatus are capable of performing precise optical measurements of layers and surface properties (SB, SF) both transparent and also non-transparent substrates. A field stop aperture (11) in a confocal optical configuration is used to define the illumination area, and another aperture (13) is used to accept light reflected form the front (SF), or other surface, of a sample being analyzed, while blocking or rejecting the ghost reflection from the backside (SB) or other feature below the focal plane of the surface being analyzed.