Impact resistant photographic element
The invention relates to a photographic element comprising at least one layer of photosensitive silver halide, a base material wherein said base material comprises at least one bottom sheet of biaxially oriented polymer sheet and deformable tie layer material, wherein said deformable tie layer mater...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | The invention relates to a photographic element comprising at least one layer of photosensitive silver halide, a base material wherein said base material comprises at least one bottom sheet of biaxially oriented polymer sheet and deformable tie layer material, wherein said deformable tie layer material yield stress of between 6 and 10 MPa in compression which is less than 10% the yield stress of any of the other layers in the element. |
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