Plating apparatus and plating liquid removing method

A plating apparatus and a plating liquid removing method removes a plating liquid remaining on the substrate-contacting portion or its vicinity of a substrate holding member. The plating apparatus comprising a head having a rotatable housing provided with a substrate holding member for holding a sub...

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Bibliographische Detailangaben
Hauptverfasser:	SENDAI, SATOSHI, TOMIOKA, KENYA, TSUDA, KATSUMI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A plating apparatus and a plating liquid removing method removes a plating liquid remaining on the substrate-contacting portion or its vicinity of a substrate holding member. The plating apparatus comprising a head having a rotatable housing provided with a substrate holding member for holding a substrate, a plating process container, disposed below said head, for holding a plating liquid therein, and a plating liquid removing mechanism for removing a plating liquid remaining on a substrate-contacting portion or its vicinity at an inner circumferential edge of said substrate holding member.