6 mirror microlithography projection system

A projection lens uses short waves, preferably ≤ 193 nm, with entrance and exit pupils for representing an object field in an image field displaying a section of a ring field. This section has a symmetry axis and an expansion of at least 20 mm but preferably 25 mm vertical to the symmetry axis. Six...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MANN, HANS-JUERGEN, MUEHLBEYER, MICHAEL, DINGER, UDO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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