6 mirror microlithography projection system
A projection lens uses short waves, preferably ≤ 193 nm, with entrance and exit pupils for representing an object field in an image field displaying a section of a ring field. This section has a symmetry axis and an expansion of at least 20 mm but preferably 25 mm vertical to the symmetry axis. Six...
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | A projection lens uses short waves, preferably ≤ 193 nm, with entrance and exit pupils for representing an object field in an image field displaying a section of a ring field. This section has a symmetry axis and an expansion of at least 20 mm but preferably 25 mm vertical to the symmetry axis. Six mirrors (S1-S6) form a structure centred on an optical axis. Each mirror has a useful range (N1-N6), in which rays of light fall that are guided by the projection lens. |
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