DEVICE FOR TREATING WAFERS

An installation for processing wafers in at least one clean room is described. The installation has a configuration of production units for carrying out individual production steps and measuring units for inspecting the production steps. The production units and the measuring units are connected via...

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Bibliographische Detailangaben
1. Verfasser: GOETZKE, MICHAEL
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:An installation for processing wafers in at least one clean room is described. The installation has a configuration of production units for carrying out individual production steps and measuring units for inspecting the production steps. The production units and the measuring units are connected via a transport system for feeding and removing the wafers. At least one measuring unit together with an unloading station for delivering wafers to the transport system forms a measuring station, in which case wafers processed so as to be free of defects can be delivered from the measuring station separately from the remaining wafers.