A method for removing a coating from a substrate

A method for selectively removing one or more coatings from the surface of a substrate is described. The coating is treated with an aqueous composition which includes an acid of the formula HxAF6, or precursors to such an acid. In that formula, A is Si, Ge, Ti, Zr, Al, and Ga; and x is 1-6. The acid...

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Bibliographische Detailangaben
Hauptverfasser: RUUD, JAMES ANTHONY, LAGRAFF, JOHN ROBERT, KOOL, LAWRENCE BERNARD
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method for selectively removing one or more coatings from the surface of a substrate is described. The coating is treated with an aqueous composition which includes an acid of the formula HxAF6, or precursors to such an acid. In that formula, A is Si, Ge, Ti, Zr, Al, and Ga; and x is 1-6. The acid is often H2SiF6. The composition may sometimes include at least one additional acid, such as phosphoric acid. The coating being removed is often an aluminide coating or an MCrAl(X)-type material. The substrate is usually a polymer or a metal, such as a superalloy.