Projection exposure system with reflective reticle

The system has a light source (1), an illumination system (2) with an illumination beam path (100), a reflective reticle (5), a reduction objective (71,72) with an imaging beam path (200) and a first beam divider cube (3) in the reduction objective that superimposes the illumination and imaging beam...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MUELLER, HENRIETTE, FUERTER, GERD, WAGNER, CHRISTIAN, GOEDECKE, UWE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The system has a light source (1), an illumination system (2) with an illumination beam path (100), a reflective reticle (5), a reduction objective (71,72) with an imaging beam path (200) and a first beam divider cube (3) in the reduction objective that superimposes the illumination and imaging beam paths. Optical elements (71) are arranged between the beam divider cube and the reflective reticle. Independent claims are also included for the following: a method of manufacturing a micro structured component.