Sputtering target and method of making same

There is disclosed a sputtering target comprising a body of metal such as aluminum and its alloy with an ultra-fine grain size and small second phase. Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a wo...

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Bibliographische Detailangaben
Hauptverfasser: KARDOKUS, JANINE KIYABU, DUNLOP, JOHN ALDEN, YUAN, JUN, EMIGH, ROGER ALAN
Format: Patent
Sprache:eng ; fre ; ger
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