Sputtering target and method of making same

There is disclosed a sputtering target comprising a body of metal such as aluminum and its alloy with an ultra-fine grain size and small second phase. Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a wo...

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Bibliographische Detailangaben
Hauptverfasser:	KARDOKUS, JANINE KIYABU, DUNLOP, JOHN ALDEN, YUAN, JUN, EMIGH, ROGER ALAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ALLOYS AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKINGWITHOUT ESSENTIALLY REMOVING MATERIAL CASTING CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES,OTHERWISE THAN BY ROLLING MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL METALLURGY PERFORMING OPERATIONS POWDER METALLURGY PUNCHING METAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	There is disclosed a sputtering target comprising a body of metal such as aluminum and its alloy with an ultra-fine grain size and small second phase. Also described in a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece (60), and fabricating the workpiece (60) to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing gain size of still smaller size and controlled grain texture.