Method for removing contaminants by brushing

In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a fi...

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Hauptverfasser: DELARIOS, JOHN M, RAVKIN, MIKHAIL, GARDNER, DOUGLAS, G
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Sprache:eng ; fre ; ger
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creator DELARIOS, JOHN M
RAVKIN, MIKHAIL
GARDNER, DOUGLAS, G
description In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.
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language eng ; fre ; ger
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subjects BASIC ELECTRIC ELEMENTS
BRUSHES
BRUSHWARE
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HUMAN NECESSITIES
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
title Method for removing contaminants by brushing
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